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Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles Mask blanks or pellicles therefor Containers specially adapted therefor Preparation thereof
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Industry
CPC
G03F1/00
This industry / category may be too specific. Please go to a parent level for more data
Parent Industries
G
PHYSICS
G03
Photography
G03F
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES
Current Industry
G03F1/00
Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles Mask blanks or pellicles therefor Containers specially adapted therefor Preparation thereof
Sub Industries
G03F1/0007
using an elastic substrate or involving an optical distortion
G03F1/0015
by drawing, writing
G03F1/0023
the masking pattern being obtained by the application of an ink
G03F1/003
the masking pattern being obtained by thermal means
G03F1/0038
using chemical means
G03F1/0046
Phase shift masks
G03F1/0053
Hybrid phase shift masks
G03F1/0061
Alternating phase shift masks
G03F1/0069
Auxiliary patterns or specific arrangements of the phase-shifting elements to avoid phase-conflicts
G03F1/0076
Masks with semi-transparent phase shifters
G03F1/0084
Masks where at least part of the patterns comprise no opaque or semi-opaque pattern elements
G03F1/0092
Auxiliary processes relating to originals
G03F1/02
by photographic processes for production of originals simulating relief
G03F1/04
by montage processes
G03F1/06
from printing surfaces
G03F1/08
Originals having inorganic imaging layers
G03F1/10
by exposing and washing out pigmented or coloured organic layers; by colouring macromolecular patterns
G03F1/103
the masking pattern being obtained by modification of the polymeric pattern by energetic means
G03F1/106
the masking means
G03F1/12
by exposing silver-halide-containing photosensitive materials or diazo-type materials
G03F1/14
Originals characterised by structural details
G03F1/142
Pellicles, pellicle rings or continuous protective layers
G03F1/144
Auxiliary patterns; Corrected patterns
G03F1/146
Originals for X-Ray exposures, X-Ray masks
G03F1/148
X-Ray absorbers
G03F1/16
Originals having apertures
G03F1/20
Masks or mask blanks for imaging by charged particle beam [CPB] radiation
G03F1/22
Masks or mask blanks for imaging by radiation of 100nm or shorter wavelength
G03F1/24
Reflection masks Preparation thereof
G03F1/26
Phase shift masks [PSM] PSM blanks Preparation thereof
G03F1/28
with three or more diverse phases on the same PSM Preparation thereof
G03F1/29
Rim PSM or outrigger PSM Preparation thereof
G03F1/30
Alternating PSM
G03F1/32
Attenuating PSM [att-PSM]
G03F1/34
Phase-edge PSM
G03F1/36
Masks having proximity correction features Preparation thereof
G03F1/38
Masks having auxiliary features
G03F1/40
Electrostatic discharge [ESD] related features
G03F1/42
Alignment or registration features
G03F1/44
Testing or measuring features
G03F1/46
Antireflective coatings
G03F1/48
Protective coatings
G03F1/50
Mask blanks not covered by G03F1/20 - G03F1/34 Preparation thereof
G03F1/52
Reflectors
G03F1/54
Absorbers
G03F1/56
Organic absorbers
G03F1/58
having two or more different absorber layers
G03F1/60
Substrates
G03F1/62
Pellicles, e.g. pellicle assemblies
G03F1/64
characterised by the frames
G03F1/66
Containers specially adapted for masks, mask blanks or pellicles Preparation thereof
G03F1/68
Preparation processes not covered by groups G03F1/20 - G03F1/50
G03F1/70
Adapting basic layout or design of masks to lithographic process requirement, e.g., second iteration correction of mask patterns for imaging
G03F1/72
Repair or correction of mask defects
G03F1/74
by charged particle beam [CPB]
G03F1/76
Patterning of masks by imaging
G03F1/78
by charged particle beam [CPB]
G03F1/80
Etching
G03F1/82
Auxiliary processes
G03F1/84
Inspecting
G03F1/86
by charged particle beam [CPB]
G03F1/88
prepared by photographic processes for production of originals simulating relief
G03F1/90
prepared by montage processes
G03F1/92
prepared from printing surfaces
Industries
Overview
Organizations
People
Information
Impact
Patents Grants
last 30 patents
Information
Patent Grant
Lithography mask repair by simulation of photoresist thickness evol...
Patent number
11,966,156
Issue date
Apr 23, 2024
KLA Corporation
Pradeep Vukkadala
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Task completion in a tracking device environment
Patent number
11,968,321
Issue date
Apr 23, 2024
Tile, Inc.
Felipe Knorr Kuhn
G06 - COMPUTING CALCULATING COUNTING
Information
Patent Grant
Debris removal from high aspect structures
Patent number
11,964,310
Issue date
Apr 23, 2024
Bruker Nano, Inc.
Tod Evan Robinson
B08 - CLEANING
Information
Patent Grant
Optical lithography system and method of using the same
Patent number
11,960,211
Issue date
Apr 16, 2024
Taiwan Semiconductor Manufacturing Co., Ltd
Hung-Jui Kuo
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Mask, flexible display panel and manufacturing method thereof
Patent number
11,963,431
Issue date
Apr 16, 2024
Chengdu BOE Optoelectronics Technology Co., Ltd.
Qian Hu
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Method of critical dimension control by oxygen and nitrogen plasma...
Patent number
11,960,201
Issue date
Apr 16, 2024
Taiwan Semiconductor Manufacturing Co., Ltd
Pei-Cheng Hsu
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
EUV mask defect tool apparatus
Patent number
11,960,202
Issue date
Apr 16, 2024
EUV TECH, INC.
Chami N Perera
G01 - MEASURING TESTING
Information
Patent Grant
Measurement method and apparatus
Patent number
11,953,823
Issue date
Apr 9, 2024
ASML Netherlands B.V.
Christopher Alan Spence
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Method for reticle enhancement technology of a design pattern to be...
Patent number
11,953,824
Issue date
Apr 9, 2024
D2S, Inc.
Akira Fujimura
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Reflective mask blank for EUV lithography, reflective mask for EUV...
Patent number
11,953,822
Issue date
Apr 9, 2024
AGC Inc.
Hirotomo Kawahara
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Method of mask data synthesis and mask making
Patent number
11,947,254
Issue date
Apr 2, 2024
Taiwan Semiconductor Manufacturing Company, Ltd
Hsu-Ting Huang
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Method for making photolithography mask plate
Patent number
11,947,255
Issue date
Apr 2, 2024
Tsinghua University
Mo Chen
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Autofocusing method for an imaging device
Patent number
11,947,185
Issue date
Apr 2, 2024
Carl Zeiss SMT GmbH
Dirk Seidel
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Exposure mask and display device manufactured by using the same
Patent number
11,947,223
Issue date
Apr 2, 2024
Samsung Display Co., Ltd.
Dong Hee Shin
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Simultaneous double-side coating of multilayer graphene pellicle by...
Patent number
11,947,256
Issue date
Apr 2, 2024
ASML Netherlands B.V.
Evgenia Kurganova
C01 - INORGANIC CHEMISTRY
Information
Patent Grant
Method for making photolithography mask plate
Patent number
11,947,261
Issue date
Apr 2, 2024
Tsinghua University
Mo Chen
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Pellicle removal tool
Patent number
11,948,824
Issue date
Apr 2, 2024
Photronics, Inc.
Hilario Ar-Miguel Alvarez
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Reticle processing system
Patent number
11,940,724
Issue date
Mar 26, 2024
Applied Materials, Inc.
Sanjay Bhat
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Phase shift blankmask and photomask for EUV lithography
Patent number
11,940,725
Issue date
Mar 26, 2024
S&S TECH CO., LTD.
Cheol Shin
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Reticle enclosure for lithography systems
Patent number
11,940,727
Issue date
Mar 26, 2024
Taiwan Semiconductor Manufacturing Company, Ltd
Chih-Tsung Shih
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Mask protective module, pellicle having the same, and lithography a...
Patent number
11,940,726
Issue date
Mar 26, 2024
Industry-University Cooperation Foundation Hanyang University
Jinho Ahn
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Method of fabricating reticle
Patent number
11,940,737
Issue date
Mar 26, 2024
Taiwan Semiconductor Manufacturing Co., Ltd
Hsueh-Yi Chung
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Mask fingerprint using mask sensitive circuit
Patent number
11,934,094
Issue date
Mar 19, 2024
International Business Machines Corporation
Effendi Leobandung
G06 - COMPUTING CALCULATING COUNTING
Information
Patent Grant
Frame member for electron beam lithography device and electron beam...
Patent number
11,934,096
Issue date
Mar 19, 2024
Kyocera Corporation
Shigenobu Furukawa
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Optical proximity correction device and method
Patent number
11,934,106
Issue date
Mar 19, 2024
United Microelectronics Corp.
Shu-Yen Liu
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Method of annealing reflective photomask by using laser
Patent number
11,934,092
Issue date
Mar 19, 2024
Samsung Electronics Co., Ltd.
Hakseung Han
B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information
Patent Grant
Reflective mask blank for EUV lithography and substrate with conduc...
Patent number
11,934,093
Issue date
Mar 19, 2024
AGC Inc.
Yusuke Ono
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Method of managing critical dimension error of photomask and method...
Patent number
11,934,095
Issue date
Mar 19, 2024
Samsung Display Co., Ltd.
Jaehyuk Chang
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Photolithography mask and photolithography system comprising said p...
Patent number
11,934,091
Issue date
Mar 19, 2024
TECHNOLOGIES DIGITHO INC.
Richard Beaudry
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Quartz glass plate
Patent number
11,927,882
Issue date
Mar 12, 2024
Shin-Etsu Quartz Products Co., Ltd.
Tatsuya Mori
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Patents Applications
last 30 patents
Information
Patent Application
SUBSTRATE WITH MULTILAYER REFLECTIVE FILM, REFLECTIVE MASK BLANK, R...
Publication number
20240134265
Publication date
Apr 25, 2024
HOYA CORPORATION
Teiichiro UMEZAWA
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
LITHOGRAPHY MASK
Publication number
20240134268
Publication date
Apr 25, 2024
Taiwan Semiconductor Manufacturing Company, Ltd.
Chien-Cheng Chen
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
ENHANCED MASK PATTERN-AWARE HEURISTICS FOR OPTICAL PROXIMITY CORREC...
Publication number
20240134269
Publication date
Apr 25, 2024
Intel Corporation
Timothy C. Johnston
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
OPERATING A METROLOGY SYSTEM, LITHOGRAPHIC APPARATUS, AND METHODS T...
Publication number
20240134289
Publication date
Apr 25, 2024
ASML NETHERLANDS B.V.
Bram Paul Theodoor VAN GOCH
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
EUV PHOTO MASKS AND MANUFACTURING METHOD THEREOF
Publication number
20240134266
Publication date
Apr 25, 2024
Taiwan Semiconductor Manufacturing Company, Ltd.
Yun-Yue LIN
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
REFLECTION TYPE MASK BLANK AND METHOD FOR MANUFACTURING SAME
Publication number
20240134267
Publication date
Apr 25, 2024
AGC Inc.
Wataru NISHIDA
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
PHASE SHIFT BLANKMASK AND PHOTOMASK FOR EUV LITHOGRAPHY
Publication number
20240126162
Publication date
Apr 18, 2024
S&S TECH CO., LTD.
Yong-Dae KIM
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
OPTICAL IMAGING METHOD, DEVICE AND SYSTEM FOR PHOTOLITHOGRAPHY SYSTEM
Publication number
20240126179
Publication date
Apr 18, 2024
Wuhan Yuwei Optical Software Co., Ltd.
Haiqing Wei
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
PHASE SHIFT BLANKMASK AND PHOTOMASK FOR EUV LITHOGRAPHY
Publication number
20240126163
Publication date
Apr 18, 2024
S&S TECH CO., LTD.
Yong-Dae KIM
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
EXTREME ULTRAVIOLET (EUV) MASK AND MANUFACTURING METHOD THEREOF
Publication number
20240126161
Publication date
Apr 18, 2024
Samsung Electronics Co., Ltd.
Sungwoo JANG
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
REFLECTIVE PHOTOMASK BLANK AND REFLECTIVE PHOTOMASK
Publication number
20240126160
Publication date
Apr 18, 2024
TOPPAN PHOTOMASK CO., LTD.
Ayumi GODA
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
Reticle Constructions and Photo-Processing Methods
Publication number
20240126164
Publication date
Apr 18, 2024
Micron Technology, Inc.
Chung-Yi Lee
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
FLEXOGRAPHIC PRINTING PLATE PRECURSOR AND MANUFACTURING METHOD OF F...
Publication number
20240126173
Publication date
Apr 18, 2024
FUJIFILM CORPORATION
Kazuki WATANABE
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
REFLECTIVE PHOTOMASK BLANK AND REFLECTIVE PHOTOMASK
Publication number
20240118604
Publication date
Apr 11, 2024
TOPPAN PHOTOMASK CO., LTD.
Ryohei GORAI
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
APPARATUS FOR TREATING SUBSTRATE AND METHOD FOR TREATING A SUBSTRATE
Publication number
20240118607
Publication date
Apr 11, 2024
SEMES CO.,LTD
Hyun YOON
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
MULTIPLE PATTERNING WITH ORGANOMETALLIC PHOTOPATTERNABLE LAYERS WIT...
Publication number
20240118614
Publication date
Apr 11, 2024
INPRIA CORPORATION
Peter de Schepper
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
METHOD FOR FORMING PHOTOMASK
Publication number
20240118605
Publication date
Apr 11, 2024
Powerchip Semiconductor Manufacturing Corporation
Chun-Liang Lin
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
IMPROVED TARGETS FOR DIFFRACTION-BASED OVERLAY ERROR METROLOGY
Publication number
20240118606
Publication date
Apr 11, 2024
KLA Corporation
Itay GDOR
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
DEVICE AND METHOD FOR PHOTOMASK CLEANING AND FLIPPING
Publication number
20240118608
Publication date
Apr 11, 2024
Chun-Jung Chiu
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
A MACHINE LEARNING MODEL USING TARGET PATTERN AND REFERENCE LAYER P...
Publication number
20240119582
Publication date
Apr 11, 2024
ASML NETHERLANDS B.V.
Quan ZHANG
G06 - COMPUTING CALCULATING COUNTING
Information
Patent Application
PELLICLE MEMBRANE FOR A LITHOGRAPHIC APPARATUS AND METHOD
Publication number
20240116760
Publication date
Apr 11, 2024
Paul Alexander VERMEULEN
B82 - NANO-TECHNOLOGY
Information
Patent Application
USING A MACHINE TRAINED NETWORK DURING ROUTING TO ACCOUNT FOR OPC COST
Publication number
20240119214
Publication date
Apr 11, 2024
D2S, INC.
Donald Oriordan
G06 - COMPUTING CALCULATING COUNTING
Information
Patent Application
METHODS AND APPARATUS FOR RUTHENIUM OXIDE REDUCTION ON EXTREME ULTR...
Publication number
20240118603
Publication date
Apr 11, 2024
APPLIED MATERALS, INC.
Banqiu WU
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION AND RESIST PATTERN...
Publication number
20240118613
Publication date
Apr 11, 2024
Shin-Etsu Chemical Co., Ltd.
Keiichi Masunaga
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
Mask for X-Ray Lithography and Metrology
Publication number
20240112913
Publication date
Apr 4, 2024
Anne Sakdinawat
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
LAYOUT DESIGN METHOD AND METHOD OF MANUFACTURING INTEGRATED CIRCUIT...
Publication number
20240104287
Publication date
Mar 28, 2024
Samsung Electronics Co., Ltd.
Dawoon Choi
G06 - COMPUTING CALCULATING COUNTING
Information
Patent Application
REFLECTIVE MASK BLANK AND REFLECTIVE MASK
Publication number
20240103354
Publication date
Mar 28, 2024
HOYA CORPORATION
Yohei IKEBE
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
REFLECTIVE MASK BLANK, REFLECTIVE MASK AND METHOD FOR MANUFACTURING...
Publication number
20240103355
Publication date
Mar 28, 2024
HOYA CORPORATION
Yohei IKEBE
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
RETICLE INSPECTION AND PURGING METHOD AND TOOL
Publication number
20240103359
Publication date
Mar 28, 2024
Taiwan Semiconductor Manufacturing Company, Ltd.
Xianhui ZHOU
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
METHOD FOR ANALYZING DEFECTS OF A STRUCTURED COMPONENT
Publication number
20240103384
Publication date
Mar 28, 2024
Carl Zeiss SMT GMBH
Jan Tusch
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY