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Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating
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CPC
C23C16/00
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Parent Industries
C
CHEMISTRY METALLURGY
C23
Surface treatment
C23C
COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
Current Industry
C23C16/00
Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating
Sub Industries
C23C16/003
Coating on a liquid substrate
C23C16/006
characterized by the colour of the layer
C23C16/01
on temporary substrates
C23C16/02
Pretreatment of the material to be coated
C23C16/0209
by heating
C23C16/0218
in a reactive atmosphere
C23C16/0227
by cleaning or etching
C23C16/0236
by etching with a reactive gas
C23C16/0245
by etching with a plasma
C23C16/0254
Physical treatment to alter the texture of the surface
C23C16/0263
Irradiation with laser or particle beam
C23C16/0272
Deposition of sub-layers
C23C16/0281
of metallic sub-layers
C23C16/029
Graded interfaces
C23C16/04
Coating on selected surface areas
C23C16/042
using masks
C23C16/045
Coating cavities or hollow spaces
C23C16/047
using irradiation by energy or particles
C23C16/06
characterised by the deposition of metallic material
C23C16/08
from metal halides
C23C16/10
Deposition of chromium only
C23C16/12
Deposition of aluminium only
C23C16/14
Deposition of only one other metal element
C23C16/16
from metal carbonyl compounds
C23C16/18
from metallo-organic compounds
C23C16/20
Deposition of aluminium only
C23C16/22
characterised by the deposition of inorganic material, other than metallic material
C23C16/24
Deposition of silicon only
C23C16/26
Deposition of carbon only
C23C16/27
Diamond only
C23C16/271
using hot filaments
C23C16/272
using DC, AC or RF discharges
C23C16/274
using microwave discharges
C23C16/275
using combustion torches
C23C16/276
using plasma jets
C23C16/277
using other elements in the gas phase besides carbon and hydrogen; using other elements besides carbon, hydrogen and oxygen in case of use of combustion torches; using other elements besides carbon, hydrogen and inert gas in case of use of plasma jets
C23C16/278
doping or introduction of a secondary phase in the diamond
C23C16/279
control of diamond crystallography
C23C16/28
Deposition of only one other non-metal element
C23C16/30
Deposition of compounds, mixtures or solid solutions
C23C16/301
AIII BV compounds, where A is Al, Ga, In or Tl and B is N, P, As, Sb or Bi
C23C16/303
Nitrides
C23C16/305
Sulfides, selenides, or tellurides
C23C16/306
AII BVI compounds, where A is Zn, Cd or Hg and B is S, Se or Te
C23C16/308
Oxynitrides
C23C16/32
Carbides
C23C16/325
Silicon carbide
C23C16/34
Nitrides
C23C16/342
Boron nitride
C23C16/345
Silicon nitride
C23C16/347
Carbon nitride
C23C16/36
Carbonitrides
C23C16/38
Borides
C23C16/40
Oxides
C23C16/401
containing silicon
C23C16/402
Silicon dioxide
C23C16/403
of aluminium, magnesium or beryllium
C23C16/404
of alkaline earth metals
C23C16/405
of refractory metals or yttrium
C23C16/406
of iron group metals
C23C16/407
of zinc, germanium, cadmium, indium, tin, thallium or bismuth
C23C16/408
of copper or solid solutions thereof
C23C16/409
of the type ABO3 with A representing alkali, alkaline earth metal or lead and B representing a refractory metal, nickel, scandium or a lanthanide
C23C16/42
Silicides
C23C16/44
characterised by the method of coating
C23C16/4401
Means for minimising impurities
C23C16/4402
Reduction of impurities in the source gas
C23C16/4404
Coatings or surface treatment on the inside of the reaction chamber or on parts thereof
C23C16/4405
Cleaning of reactor or parts inside the reactor by using reactive gases
C23C16/4407
Cleaning of reactor or reactor parts by using wet or mechanical methods
C23C16/4408
by purging residual gases from the reaction chamber or gas lines
C23C16/4409
characterised by sealing means
C23C16/4411
Cooling of the reaction chamber walls
C23C16/4412
Details relating to the exhausts
C23C16/4414
Electrochemical vapour deposition [EVD]
C23C16/4415
Acoustic wave CVD
C23C16/4417
Methods specially adapted for coating powder
C23C16/4418
Methods for making free-standing articles
C23C16/442
using fluidised bed process
C23C16/448
characterised by the method used for generating reactive gas streams
C23C16/4481
by evaporation using carrier gas in contact with the source material
C23C16/4482
by bubbling of carrier gas through liquid source material
C23C16/4483
using a porous body
C23C16/4485
by evaporation without using carrier gas in contact with the source material
C23C16/4486
by producing an aerosol and subsequent evaporation of the droplets or particles
C23C16/4487
by using a condenser
C23C16/4488
by in situ generation of reactive gas by chemical or electrochemical reaction
C23C16/452
by activating reactive gas streams before their introduction into the reaction chamber
C23C16/453
passing the reaction gases through burners or torches
C23C16/455
characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
C23C16/45502
Flow conditions in reaction chamber
C23C16/45504
Laminar flow
C23C16/45506
Turbulent flow
C23C16/45508
Radial flow
C23C16/4551
Jet streams
C23C16/45512
Premixing before introduction in the reaction chamber
C23C16/45514
Mixing in close vicinity to the substrate
C23C16/45517
Confinement of gases to vicinity of substrate
C23C16/45519
Inert gas curtains
C23C16/45521
the gas, other than thermal contact gas, being introduced the rear of the substrate to flow around its periphery
C23C16/45523
Pulsed gas flow or change of composition over time
C23C16/45525
Atomic layer deposition [ALD]
C23C16/45527
characterized by the ALD cycle
C23C16/45529
specially adapted for making a layer stack of alternating different compositions or gradient compositions
C23C16/45531
specially adapted for making ternary or higher compositions
C23C16/45534
Use of auxiliary reactants other than used for contributing to the composition of the main film
C23C16/45536
Use of plasma, radiation or electromagnetic fields
C23C16/45538
Plasma being used continuously during the ALD cycle
C23C16/4554
Plasma being used non-continuously in between ALD reactions
C23C16/45542
Plasma being used non-continuously during the ALD reactions
C23C16/45544
characterized by the apparatus
C23C16/45546
specially adapted for a substrate stack in the ALD reactor
C23C16/45548
having arrangements for gas injection at different locations of the reactor for each ALD half-reaction
C23C16/45551
for relative movement of the substrate and the gas injectors or half-reaction reactor compartments
C23C16/45553
characterized by the use of precursors specially adapted for ALD
C23C16/45555
applied in non-semiconductor technology
C23C16/45557
Pulsed pressure or control pressure
C23C16/45559
Diffusion of reactive gas to substrate
C23C16/45561
Gas plumbing upstream of the reaction chamber
C23C16/45563
Gas nozzles
C23C16/45565
Shower nozzles
C23C16/45568
Porous nozzles
C23C16/4557
Heated nozzles
C23C16/45572
Cooled nozzles
C23C16/45574
Nozzles for more than one gas
C23C16/45576
Coaxial inlets for each gas
C23C16/45578
Elongated nozzles, tubes with holes
C23C16/4558
Perforated rings
C23C16/45582
Expansion of gas before it reaches the substrate
C23C16/45585
Compression of gas before it reaches the substrate
C23C16/45587
Mechanical means for changing the gas flow
C23C16/45589
Movable means
C23C16/45591
Fixed means
C23C16/45593
Recirculation of reactive gases
C23C16/45595
Atmospheric CVD gas inlets with no enclosed reaction chamber
C23C16/45597
Reactive back side gas
C23C16/458
characterised by the method used for supporting substrates in the reaction chamber
C23C16/4581
characterised by material of construction or surface finish of the means for supporting the substrate
C23C16/4582
Rigid and flat substrates
C23C16/4583
the substrate being supported substantially horizontally
C23C16/4584
the substrate being rotated
C23C16/4585
Devices at or outside the perimeter of the substrate support
C23C16/4586
Elements in the interior of the support
C23C16/4587
the substrate being supported substantially vertically
C23C16/4588
the substrate being rotated
C23C16/46
characterised by the method used for heating the substrate
C23C16/463
Cooling of the substrate
C23C16/466
using thermal contact gas
C23C16/48
by irradiation
C23C16/481
by radiant heating of the substrate
C23C16/482
using incoherent light, UV to IR
C23C16/483
using coherent light, UV to IR
C23C16/484
using X-ray radiation
C23C16/485
using synchrotron radiation
C23C16/486
using ion beam radiation
C23C16/487
using electron radiation
C23C16/488
Protection of windows for introduction of radiation into the coating chamber
C23C16/50
using electric discharges
C23C16/503
using dc or ac discharges
C23C16/505
using radio frequency discharges
C23C16/507
using external electrodes
C23C16/509
using internal electrodes
C23C16/5093
Coaxial electrodes
C23C16/5096
Flat-bed apparatus
C23C16/511
using microwave discharges
C23C16/513
using plasma jets
C23C16/515
using pulsed discharges
C23C16/517
using a combination of discharges covered by two or more of groups C23C16/503 - C23C16/515
C23C16/52
Controlling or regulating the coating process
C23C16/54
Apparatus specially adapted for continuous coating
C23C16/545
for coating elongated substrates
C23C16/56
After-treatment
Industries
Overview
Organizations
People
Information
Impact
Patents Grants
last 30 patents
Information
Patent Grant
Method for nucleation of conductive nitride films
Patent number
11,965,239
Issue date
Apr 23, 2024
Entegris, Inc.
Gavin Richards
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Grant
Deposition method and deposition apparatus
Patent number
11,965,246
Issue date
Apr 23, 2024
Tokyo Electron Limited
Naonori Fujiwara
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Grant
Coated cutting tool
Patent number
11,964,329
Issue date
Apr 23, 2024
Tungaloy Corporation
Tsukasa Shirochi
B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information
Patent Grant
Thin film manufacturing apparatus
Patent number
11,967,492
Issue date
Apr 23, 2024
AP SYSTEMS INC.
Byoung Il Lee
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Grant
Crystalline oxide semiconductor film and semiconductor device
Patent number
11,967,618
Issue date
Apr 23, 2024
FLOSFIA INC.
Isao Takahashi
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Grant
Coated tool and cutting tool
Patent number
11,964,328
Issue date
Apr 23, 2024
Kyocera Corporation
Tadashi Katsuma
B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information
Patent Grant
Cluster tools, systems, and methods having one or more pressure sta...
Patent number
11,965,241
Issue date
Apr 23, 2024
Applied Materials, Inc.
Saurabh Chopra
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Substrate processing apparatus and method of manufacturing semicond...
Patent number
11,967,501
Issue date
Apr 23, 2024
Kokusai Electric Corporation
Hiroaki Hiramatsu
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Grant
Mechanically pre-biased shadow mask and method of formation
Patent number
11,968,881
Issue date
Apr 23, 2024
Emagin Corporation
James A. Walker
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Grant
Systems and methods for depositing low-k dielectric films
Patent number
11,967,498
Issue date
Apr 23, 2024
Applied Materials, Inc.
Bo Xie
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Grant
Selective deposition of metal oxides on metal surfaces
Patent number
11,965,238
Issue date
Apr 23, 2024
ASM IP Holding B.V.
Andrea Illiberi
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Grant
Cleaning method, method of manufacturing semiconductor device, and...
Patent number
11,965,240
Issue date
Apr 23, 2024
Kokusai Electric Corporation
Keigo Nishida
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Substrate supporting plate, thin film deposition apparatus includin...
Patent number
11,965,262
Issue date
Apr 23, 2024
ASM IP Holding B.V.
Yong Min Yoo
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Nitride semiconductor substrate, laminate, substrate selection prog...
Patent number
11,967,617
Issue date
Apr 23, 2024
Sumitomo Chemical Company, Limited
Fumimasa Horikiri
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Grant
Raw material supply apparatus and raw material supply method
Patent number
11,965,242
Issue date
Apr 23, 2024
Tokyo Electron Limited
Seishi Murakami
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Grant
Method and apparatus for making a vapor of precise concentration by...
Patent number
11,965,243
Issue date
Apr 23, 2024
CeeVee Tech, LLC
Egbert G. Woelk
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Grant
Substrate processing method, substrate processing apparatus using t...
Patent number
11,965,244
Issue date
Apr 23, 2024
Wonik IPS Co., Ltd.
Kyung Park
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Method for treatment of deposition reactor
Patent number
11,967,488
Issue date
Apr 23, 2024
ASM IP Holding B.V.
Suvi Haukka
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Grant
Plasma generating device, substrate processing apparatus, and metho...
Patent number
11,967,490
Issue date
Apr 23, 2024
Kokusai Electric Corporation
Akihiro Sato
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Grant
Method of processing substrate, method of manufacturing semiconduct...
Patent number
11,967,499
Issue date
Apr 23, 2024
Kokusai Electric Corporation
Yoshitomo Hashimoto
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Grant
Substrate support for chucking of mask for deposition processes
Patent number
11,967,516
Issue date
Apr 23, 2024
Applied Materials, Inc.
Jrjyan Jerry Chen
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Grant
Activated gas generation apparatus
Patent number
11,968,768
Issue date
Apr 23, 2024
Toshiba Mitsubishi-Electric Industrial Systems Corporation
Kensuke Watanabe
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Grant
Method of producing an alumina dispersible at a pH greater than 8
Patent number
11,965,245
Issue date
Apr 23, 2024
Allison L. Hann
C01 - INORGANIC CHEMISTRY
Information
Patent Grant
Immersion exposure tool
Patent number
11,966,165
Issue date
Apr 23, 2024
Taiwan Semiconductor Manufacturing Company, Ltd
Yung-Yao Lee
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Grant
Plasma processing apparatus
Patent number
11,967,511
Issue date
Apr 23, 2024
Tokyo Electron Limited
Akira Ishikawa
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Grant
Method for producing GaN layered substrate
Patent number
11,967,530
Issue date
Apr 23, 2024
Shin-Etsu Chemical Co., Ltd.
Sumio Sekiyama
B32 - LAYERED PRODUCTS
Information
Patent Grant
Method of manufacturing semiconductor device, substrate processing...
Patent number
11,967,500
Issue date
Apr 23, 2024
Kokusai Electric Corporation
Arito Ogawa
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Grant
Capacitive sensor for monitoring gas concentration
Patent number
11,959,868
Issue date
Apr 16, 2024
Applied Materials, Inc.
Xiaopu Li
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Grant
Selective cobalt deposition on copper surfaces
Patent number
11,959,167
Issue date
Apr 16, 2024
Applied Materials, Inc.
Sang-Ho Yu
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Grant
Methods of forming a transition metal containing film on a substrat...
Patent number
11,959,171
Issue date
Apr 16, 2024
ASM IP Holding B.V.
Timo Hatanpää
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Patents Applications
last 30 patents
Information
Patent Application
METHOD FOR MAKING A BRAKING BAND OF A BRAKE DISC, METHOD FOR MAKING...
Publication number
20240132999
Publication date
Apr 25, 2024
Brembo S.p.A.
Andrea MILANESI
C22 - METALLURGY FERROUS OR NON-FERROUS ALLOYS TREATMENT OF ALLOYS OR NON-FER...
Information
Patent Application
FILM FORMING DEVICE AND FILM FORMING METHOD
Publication number
20240133031
Publication date
Apr 25, 2024
TOKYO ELECTRON LIMITED
Jun YAMAWAKU
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
SUBSTRATE RETAINING APPARATUS, SYSTEM INCLUDING THE APPARATUS, AND...
Publication number
20240133035
Publication date
Apr 25, 2024
ASM IP HOLDING B.V.
SHIVA K.T. RAJAVELU MURALIDHAR
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
PECVD COATING SYSTEM AND COATING METHOD
Publication number
20240133036
Publication date
Apr 25, 2024
JIANGSU FAVORED NANOTECHNOLOGY CO., LTD.
Jian ZONG
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Application
NON-METAL INCORPORATION IN MOLYBDENUM ON DIELECTRIC SURFACES
Publication number
20240136192
Publication date
Apr 25, 2024
LAM RESEARCH CORPORATION
Lawrence Schloss
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Application
OXIDE SEMICONDUCTOR FILM AND FILM-FORMING METHOD THE SAME, SEMICOND...
Publication number
20240136179
Publication date
Apr 25, 2024
Shin-Etsu Chemical Co., Ltd.
Takahiro SAKATSUME
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Application
MASK ASSEMBLY AND MANUFACTURING METHOD THEREOF
Publication number
20240133019
Publication date
Apr 25, 2024
SAMSUNG DISPLAY CO., LTD.
Jongdae Lee
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Application
Nanoporous GaN on p-type GaN: A Mg out-diffusion compensation layer...
Publication number
20240133027
Publication date
Apr 25, 2024
Srabanti Chowdhury
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Application
Electrolyte and Method for Cobalt Electrodeposition
Publication number
20240133028
Publication date
Apr 25, 2024
Hermine Marie Berthon
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Application
ALD DEPOSITION METHOD AND SYSTEM
Publication number
20240133030
Publication date
Apr 25, 2024
ASM IP HOLDING B.V.
Dieter Pierreux
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Application
REACTANT DELIVERY SYSTEM AND REACTOR SYSTEM INCLUDING SAME
Publication number
20240133033
Publication date
Apr 25, 2024
ASM IP HOLDING B.V.
Jacqueline Wrench
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Application
METHOD FOR IMPROVING ADHESION OF YTTRIUM-BASED THIN FILM
Publication number
20240133037
Publication date
Apr 25, 2024
SHINRYO CORPORATION
Yuriko YANAI
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Application
TRIPOLAR ELECTRODE ARRANGEMENT FOR ELECTROSTATIC CHUCKS
Publication number
20240136161
Publication date
Apr 25, 2024
LAM RESEARCH CORPORATION
Karl Frederick LEESER
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Application
METHOD FOR MANUFACTURING AN ELECTROCHEMICAL COMPONENT COMPRISING A...
Publication number
20240136495
Publication date
Apr 25, 2024
Pulsedeon Oy
Ville KEKKONEN
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Application
METHOD OF PROCESSING SUBSTRATE, METHOD OF MANUFACTURING SEMICONDUCT...
Publication number
20240133026
Publication date
Apr 25, 2024
Koei KURIBAYASHI
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
FILM-FORMING APPARATUS, FILM-FORMING METHOD, GALLIUM OXIDE FILM AND...
Publication number
20240133029
Publication date
Apr 25, 2024
Shin-Etsu Chemical Co., Ltd.
Takahiro SAKATSUME
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Application
DEPOSITING A CARBON HARDMASK BY HIGH POWER PULSED LOW FREQUENCY RF
Publication number
20240136153
Publication date
Apr 25, 2024
LAM RESEARCH CORPORATION
Matthew Scott Weimer
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Application
IMPEDANCE CONTROL OF LOCAL AREAS OF A SUBSTRATE DURING PLASMA DEPOS...
Publication number
20240136160
Publication date
Apr 25, 2024
Applied Materials, Inc.
Zheng John YE
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Application
SYSTEM AND METHOD FOR MANUFACTURING PLURALITY OF INTEGRATED CIRCUITS
Publication number
20240136211
Publication date
Apr 25, 2024
Pragmatic Printing Ltd.
Richard David PRICE
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Application
TRANSITION METAL DEPOSITION METHOD
Publication number
20240133032
Publication date
Apr 25, 2024
ASM IP HOLDING B.V.
Charles Dezelah
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Application
FLOATING TOOLING ASSEMBLY FOR CHEMICAL VAPOR INFILTRATION
Publication number
20240133034
Publication date
Apr 25, 2024
Raytheon Technologies Corporation
Alyson T. Burdette
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Application
MASK ASSEMBLY AND MASK ASSEMBLY MANUFACTURING METHOD
Publication number
20240124965
Publication date
Apr 18, 2024
SAMSUNG DISPLAY CO., LTD.
JEONGKUK KIM
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Application
VAPORIZATION DEVICE, SEMICONDUCTOR MANUFACTURING SYSTEM, AND METHOD...
Publication number
20240124971
Publication date
Apr 18, 2024
TOKYO ELECTRON LIMITED
Yuichi FURUYA
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Application
METHODS FOR DEPOSITING CARBON CONDUCTING FILMS BY ATOMIC LAYER DEPO...
Publication number
20240124977
Publication date
Apr 18, 2024
Micron Technology, Inc.
Jean-Sebastien Materne Lehn
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Application
MULTI-LAYERED VENTILATION APPARATUS AND METHODS OF MANUFACTURING TH...
Publication number
20240125126
Publication date
Apr 18, 2024
William Boone Daniels
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Application
SEMICONDUCTOR MANUFACTURING FACILITY AND METHOD OF OPERATING THE SAME
Publication number
20240128065
Publication date
Apr 18, 2024
LOT CES CO., LTD.
Jin Ho BAE
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THE UNIVERSITY OF TOKYO
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