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G03F7/00
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Parent Industries
G
PHYSICS
G03
Photography
G03F
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES
Current Industry
G03F7/00
Photomechanical
Sub Industries
G03F7/0002
Lithographic processes using patterning methods other than those involving the exposure to radiation
G03F7/0005
Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
G03F7/0007
Filters
G03F7/001
Phase modulating patterns
G03F7/0012
Processes making use of the tackiness of the photolithographic materials
G03F7/0015
Production of aperture devices, microporous systems or stamps
G03F7/0017
for the production of embossing, cutting or similar devices; for the production of casting means
G03F7/002
using materials containing microcapsules; Preparing or processing such materials
G03F7/0022
Devices or apparatus
G03F7/0025
characterised by means for coating the developer
G03F7/0027
characterised by pressure means
G03F7/003
characterised by storage means for the light sensitive material
G03F7/0032
characterised by heat providing or glossing means
G03F7/0035
Multiple processes
G03F7/0037
Production of three-dimensional images
G03F7/004
Photosensitive materials
G03F7/0041
providing an etching agent upon exposure
G03F7/0042
with inorganic or organometallic light-sensitive compounds not otherwise provided for
G03F7/0043
Chalcogenides; Silicon, germanium, arsenic or derivatives thereof; Metals, oxides or alloys thereof
G03F7/0044
involving an interaction between the metallic and non-metallic component
G03F7/0045
with organic non-macromolecular light-sensitive compounds not otherwise provided for
G03F7/0046
with perfluoro compounds
G03F7/0047
characterised by additives for obtaining a metallic or ceramic pattern
G03F7/0048
characterised by the solvents or agents facilitating spreading
G03F7/008
Azides
G03F7/0085
characterised by the non-macromolecular additives
G03F7/012
Macromolecular azides Macromolecular additives
G03F7/0125
characterised by the polymeric binder or the macromolecular additives other than the macromolecular azides
G03F7/016
Diazonium salts or compounds
G03F7/0163
Non ionic diazonium compounds
G03F7/0166
characterised by the non-macromolecular additives
G03F7/021
Macromolecular diazonium compounds Macromolecular additives
G03F7/0212
characterised by the polymeric binder or the macromolecular additives other than the diazo resins or the polymeric diazonium compounds
G03F7/0215
Natural gums; Proteins
G03F7/0217
Polyurethanes; Epoxy resins
G03F7/022
Quinonediazides
G03F7/0223
Iminoquinonediazides; Para-quinonediazides
G03F7/0226
characterised by the non-macromolecular additives
G03F7/023
Macromolecular quinonediazides Macromolecular additives
G03F7/0233
characterised by the polymeric binders or the macromolecular additives other than the macromolecular quinonediazides
G03F7/0236
Condensation products of carbonyl compounds and phenolic compounds
G03F7/025
Non-macromolecular photopolymerisable compounds having carbon-to-carbon triple bonds
G03F7/027
Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds
G03F7/0275
with dithiol or polysulfide compounds
G03F7/028
with photosensitivity-increasing substances
G03F7/0285
Silver salts
G03F7/029
Inorganic compounds Onium compounds Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
G03F7/0295
Photolytic halogen compounds
G03F7/031
Organic compounds not covered by group G03F7/029
G03F7/032
with binders
G03F7/0325
the binders being polysaccharides
G03F7/033
the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds
G03F7/035
the binders being polyurethanes
G03F7/037
the binders being polyamides or polyimides
G03F7/038
Macromolecular compounds which are rendered insoluble or differentially wettable
G03F7/0381
using a combination of a phenolic resin and a polyoxyethylene resin
G03F7/0382
the macromolecular compound being present in a chemically amplified negative photoresist composition
G03F7/0384
with ethylenic or acetylenic bands in the main chain of the photopolymer
G03F7/0385
using epoxydisednovolak resin
G03F7/0387
Polyamides or polyimides
G03F7/0388
with ethylenic or acetylenic bands in the side chains of the photopolymer
G03F7/039
Macromolecular compounds which are photodegradable
G03F7/0392
the macromolecular compound being present in a chemically amplified positive photoresist composition
G03F7/0395
the macromolecular compound having a backbone with alicyclic moieties
G03F7/0397
the alicyclic moiety being in a side chain
G03F7/04
Chromates
G03F7/06
Silver salts
G03F7/063
Additives or means to improve the lithographic properties; Processing solutions characterised by such additives; Treatment after development or transfer
G03F7/066
Organic derivatives of bivalent sulfur
G03F7/07
used for diffusion transfer
G03F7/075
Silicon-containing compounds
G03F7/0751
used as adhesion-promoting additives or as means to improve adhesion
G03F7/0752
in non photosensitive layers or as additives
G03F7/0754
Non-macromolecular compounds containing silicon-to-silicon bonds
G03F7/0755
Non-macromolecular compounds containing Si-O, Si-C or Si-N bonds
G03F7/0757
Macromolecular compounds containing Si-O, Si-C or Si-N bonds
G03F7/0758
with silicon- containing groups in the side chains
G03F7/085
Photosensitive compositions characterised by adhesion-promoting non-macromolecular additives
G03F7/09
characterised by structural details
G03F7/091
characterised by antireflection means or light filtering or absorbing means
G03F7/092
characterised by backside coating or layers, by lubricating-slip layers or means, by oxygen barrier layers or by stripping-release layers or means
G03F7/093
characterised by antistatic means
G03F7/094
Multilayer resist systems
G03F7/095
having more than one photosensitive layer
G03F7/0952
comprising silver halide or silver salt based image forming systems
G03F7/0955
one of the photosensitive systems comprising a non-macromolecular photopolymerisable compound having carbon-to-carbon double bonds
G03F7/0957
with sensitive layers on both sides of the substrate
G03F7/105
having substances
G03F7/11
having cover layers or intermediate layers
G03F7/115
having supports or layers with means for obtaining a screen effect or for obtaining better contact in vacuum printing
G03F7/12
Production of screen printing forms or similar printing forms
G03F7/14
Production of collotype printing forms
G03F7/16
Coating processes Apparatus therefor
G03F7/161
using a previously coated surface
G03F7/162
Coating on a rotating support
G03F7/164
using electric, electrostatic or magnetic means; powder coating
G03F7/165
Monolayers
G03F7/167
from the gas phase, by plasma deposition
G03F7/168
Finishing the coated layer
G03F7/18
Coating curved surfaces
G03F7/20
Exposure Apparatus therefor
G03F7/2002
with visible light or UV light, through an original having an opaque pattern on a transparent support
G03F7/2004
characterised by the use of a particular light source
G03F7/2006
using coherent light; using polarised light
G03F7/2008
characterised by the reflectors, diffusers, light or heat filtering means or anti-reflective means used
G03F7/201
characterised by an oblique exposure; characterised by the use of plural sources; characterised by the rotation of the optical device; characterised by a relative movement of the optical device, the light source, the sensitive system or the mask
G03F7/2012
using liquid photohardening compositions
G03F7/2014
Contact or film exposure of light sensitive plates such as lithographic plates or circuit boards
G03F7/2016
Contact mask being integral part of the photosensitive element and subject to destructive removal during post-exposure processing
G03F7/2018
Masking pattern obtained by selective application of an ink or a toner
G03F7/202
Masking pattern being obtained by thermal means
G03F7/2022
Multi-step exposure
G03F7/2024
of the already developed image
G03F7/2026
for the removal of unwanted material
G03F7/2028
of an edge bead on wafers
G03F7/203
comprising an imagewise exposure to electromagnetic radiation or corpuscular radiation
G03F7/2032
Simultaneous exposure of the front side and the backside
G03F7/2035
simultaneous coating and exposure; using a belt mask
G03F7/2037
Exposure with X-ray radiation or corpuscular radiation, through a mask with a pattern opaque to that radiation
G03F7/2039
X-ray radiation
G03F7/2041
in the presence of a fluid
G03F7/2043
with the production of a chemical active agent from a fluid
G03F7/2045
using originals with apertures
G03F7/2047
Exposure with radiation other than visible light or UV light
G03F7/2049
using a cantilever
G03F7/2051
Exposure without an original mask
G03F7/2053
using a laser
G03F7/2055
for the production of printing plates; Exposure of liquid photohardening compositions
G03F7/2057
using an addressed light valve
G03F7/2059
using a scanning corpuscular radiation beam
G03F7/2061
Electron scattering (proximity) correction or prevention methods
G03F7/2063
for the production of exposure masks or reticles
G03F7/2065
using corpuscular radiation other than electron beams
G03F7/213
Exposing with the same light pattern different positions of the same surface at the same time
G03F7/22
Exposing sequentially with the same light pattern different positions of the same surface
G03F7/24
Curved surfaces
G03F7/26
Processing photosensitive materials Apparatus therefor
G03F7/265
Selective reaction with inorganic or organometallic reagents after image-wise exposure
G03F7/28
for obtaining powder images
G03F7/30
Imagewise removal using liquid means
G03F7/3007
combined with electrical means
G03F7/3014
combined with ultrasonic means
G03F7/3021
from a wafer supported on a rotating chuck
G03F7/3028
characterised by means for on-wafer monitoring of the processing
G03F7/3035
from printing plates fixed on a cylinder or on a curved surface; from printing cylinders
G03F7/3042
from printing plates transported horizontally through the processing stations
G03F7/305
characterised by the brushing or rubbing means
G03F7/3057
characterised by the processing units other than the developing unit
G03F7/3064
characterised by the transport means or means for confining the different units
G03F7/3071
Process control means
G03F7/3078
Processing different kinds of plates
G03F7/3085
from plates or webs transported vertically; from plates suspended or immersed vertically in the processing unit
G03F7/3092
Recovery of material; Waste processing
G03F7/32
Liquid compositions therefor
G03F7/322
Aqueous alkaline compositions
G03F7/325
Non-aqueous compositions
G03F7/327
Non-aqueous alkaline compositions
G03F7/34
Imagewise removal by selective transfer
G03F7/343
Lamination or delamination methods or apparatus for photolitographic photosensitive material
G03F7/346
using photosensitive materials other than non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds
G03F7/36
Imagewise removal not covered by groups G03F7/30 - G03F7/34
G03F7/38
Treatment before imagewise removal
G03F7/40
Treatment after imagewise removal
G03F7/405
Treatment with inorganic or organometallic reagents after imagewise removal
G03F7/42
Stripping or agents therefor
G03F7/421
using biological means only
G03F7/422
using liquids only
G03F7/423
containing mineral acids or salts thereof, containing mineral oxidizing substances
G03F7/425
containing mineral alkaline compounds; containing organic basic compounds
G03F7/426
containing organic halogen compounds; containing organic sulfonic acids or salts thereof; containing sulfoxides
G03F7/427
using plasma means only
G03F7/428
using ultrasonic means only
G03F7/70
Exposure apparatus for microlithography
G03F7/70008
Production of exposure light
G03F7/70016
by discharge lamps
G03F7/70025
by lasers
G03F7/70033
by plasma EUV sources
G03F7/70041
by pulsed sources
G03F7/7005
by multiple sources
G03F7/70058
Mask illumination systems
G03F7/70066
Size and form of the illuminated area in the mask plane
G03F7/70075
Homogenization of illumination intensity in the mask plane, by using an integrator
G03F7/70083
Non-homogeneous intensity distribution in the mask plane
G03F7/70091
Illumination settings, i.e. intensity distribution in the pupil plane, angular distribution in the field plane; On-axis or off-axis settings
G03F7/701
Off-axis setting using an aperture
G03F7/70108
Off-axis setting using a light-guiding element
G03F7/70116
Off-axis setting using a programmable means
G03F7/70125
Use of illumination settings tailored to particular mask patterns
G03F7/70133
Measurement of illumination distribution, in pupil plane or field plane
G03F7/70141
Illumination system adjustment, alignment during assembly of illumination system
G03F7/7015
Details of optical elements
G03F7/70158
Diffractive optical elements
G03F7/70166
Capillary or channel elements
G03F7/70175
Lamphouse reflector arrangements
G03F7/70183
Zoom systems
G03F7/70191
Optical correction elements, filters or phase plates for controlling intensity, wavelength, polarization, phase or the like
G03F7/702
Reflective illumination
G03F7/70208
Multiple illumination paths
G03F7/70216
Systems for imaging mask onto workpiece
G03F7/70225
Catadioptric systems
G03F7/70233
Optical aspects of catoptric systems
G03F7/70241
Optical aspects of refractive systems
G03F7/7025
Size or form of projection system aperture
G03F7/70258
Projection system adjustment, alignment during assembly of projection system
G03F7/70266
Adaptive optics
G03F7/70275
Multiple projection paths, array of projection systems, microlens projection systems, tandem projection systems
G03F7/70283
Masks or their effects on the imaging process
G03F7/70291
Addressable masks
G03F7/703
Non-planar pattern area or non-planar masks
G03F7/70308
Optical correction elements, filters and phase plates for manipulating
G03F7/70316
Details of optical elements
G03F7/70325
Resolution enhancement techniques not otherwise provided for
G03F7/70333
Focus drilling
G03F7/70341
Immersion
G03F7/7035
Proximity or contact printer
G03F7/70358
Scanning exposure
G03F7/70366
Rotary scanning
G03F7/70375
Imaging systems not otherwise provided for
G03F7/70383
Direct write
G03F7/70391
Addressable array sources specially adapted to produce patterns
G03F7/704
Scanned exposure beam
G03F7/70408
Interferometric lithography; Holographic lithography; Self-imaging lithography
G03F7/70416
Stereolithography, 3D printing, rapid prototyping
G03F7/70425
Imaging strategies
G03F7/70433
Layout for increasing efficiency, for compensating imaging errors
G03F7/70441
Optical proximity correction
G03F7/7045
Hybrid exposure, i.e. combining different types of exposure
G03F7/70458
Mix-and-match, i.e. multiple exposures of the same area using similar types of exposure
G03F7/70466
Multiple exposures
G03F7/70475
Stitching
G03F7/70483
Information management, control, testing, and wafer monitoring
G03F7/70491
Information management and control, including software
G03F7/705
Modelling and simulation from physical phenomena up to complete wafer process or whole workflow in wafer fabrication
G03F7/70508
Data handling, in all parts of the microlithographic apparatus
G03F7/70516
Calibration of components of the microlithographic apparatus
G03F7/70525
Controlling normal operating mode
G03F7/70533
Controlling abnormal operating mode
G03F7/70541
Tagging
G03F7/7055
Exposure light control, in all parts of the microlithographic apparatus
G03F7/70558
Dose control
G03F7/70566
Polarisation control
G03F7/70575
Wavelength control
G03F7/70583
Speckle reduction
G03F7/70591
Testing optical components
G03F7/706
Aberration measurement
G03F7/70608
Wafer resist monitoring
G03F7/70616
Wafer pattern monitoring
G03F7/70625
Pattern dimensions
G03F7/70633
Overlay
G03F7/70641
Focus
G03F7/7065
Defect inspection
G03F7/70658
Electrical
G03F7/70666
using aerial image
G03F7/70675
using latent image
G03F7/70683
using process control mark
G03F7/70691
Handling of masks or wafers
G03F7/707
Chucks
G03F7/70708
being electrostatic; Electrostatically deformable vacuum chucks
G03F7/70716
Stages
G03F7/70725
control
G03F7/70733
Handling masks and workpieces
G03F7/70741
Handling masks outside exposure position
G03F7/7075
Handling workpieces outside exposure position
G03F7/70758
Drive means
G03F7/70766
Reaction force control means
G03F7/70775
Position control
G03F7/70783
Stress or warp of chucks, mask or workpiece
G03F7/70791
Large workpieces
G03F7/708
Construction of apparatus
G03F7/70808
Construction details
G03F7/70816
Bearings
G03F7/70825
Mounting of individual elements
G03F7/70833
Mounting of optical systems
G03F7/70841
Constructional issues related to vacuum environment
G03F7/7085
Detection arrangement
G03F7/70858
Environment aspects
G03F7/70866
of mask or workpiece
G03F7/70875
Temperature
G03F7/70883
of optical system
G03F7/70891
Temperature
G03F7/709
Vibration
G03F7/70908
Hygiene
G03F7/70916
Pollution mitigation, i.e. mitigating effect of contamination or debris
G03F7/70925
Cleaning
G03F7/70933
Purge
G03F7/70941
Stray fields and charges
G03F7/7095
Materials
G03F7/70958
Optical materials and coatings
G03F7/70966
Birefringence
G03F7/70975
Assembly, maintenance, transport and storage of apparatus
G03F7/70983
Optical system protection
G03F7/70991
Connection with other apparatus
Industries
Overview
Organizations
People
Information
Impact
Patents Grants
last 30 patents
Information
Patent Grant
Compound, ink, resist composition for color filter, sheet for heat-...
Patent number
11,970,438
Issue date
Apr 30, 2024
Canon Kabushiki Kaisha
Ai Hayakawa
C07 - ORGANIC CHEMISTRY
Information
Patent Grant
Cross-linked polymer for resist
Patent number
11,971,660
Issue date
Apr 30, 2024
Maruzen Petrochemical Co., LTD
Tomohiro Masukawa
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Grant
Substrate processing apparatus and substrate processing method
Patent number
11,971,661
Issue date
Apr 30, 2024
Tokyo Electron Limited
Yoji Sakata
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Digital exposure machine and exposure control method thereof
Patent number
11,971,662
Issue date
Apr 30, 2024
BOE Technology Group Co., Ltd.
Zhichong Wang
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Method for determining patterning device pattern based on manufactu...
Patent number
11,972,194
Issue date
Apr 30, 2024
ASML Netherlands B.V.
Roshni Biswas
G06 - COMPUTING CALCULATING COUNTING
Information
Patent Grant
Methods for modeling of a design in reticle enhancement technology
Patent number
11,972,187
Issue date
Apr 30, 2024
D2S, Inc.
P. Jeffrey Ungar
G06 - COMPUTING CALCULATING COUNTING
Information
Patent Grant
Determination method, determination device, exposure device, and pr...
Patent number
11,972,325
Issue date
Apr 30, 2024
Nikon Corporation
Yosuke Okudaira
G06 - COMPUTING CALCULATING COUNTING
Information
Patent Grant
Photoresist developer and method of developing photoresist
Patent number
11,971,657
Issue date
Apr 30, 2024
Taiwan Semiconductor Manufacturing Company, Ltd
An-Ren Zi
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Film vibration device and fabrication method thereof, and cleaning...
Patent number
11,969,771
Issue date
Apr 30, 2024
GUANGDONG UNIVERSITY OF TECHNOLOGY
Yun Chen
B08 - CLEANING
Information
Patent Grant
Light sources and methods of controlling; devices and methods for u...
Patent number
11,971,663
Issue date
Apr 30, 2024
ASML Netherlands B.V.
Marinus Petrus Reijnders
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Apparatus and method for creating highly-functional meta-materials...
Patent number
11,971,616
Issue date
Apr 30, 2024
PIXELDISPLAY INC.
David Wyatt
B82 - NANO-TECHNOLOGY
Information
Patent Grant
Method for manufacturing a membrane assembly
Patent number
11,971,656
Issue date
Apr 30, 2024
ASML Netherlands B.V.
Johan Hendrik Klootwijk
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Sequential infiltration synthesis apparatus
Patent number
11,970,766
Issue date
Apr 30, 2024
ASM IP Holding B.V.
Ivo Johannes Raaijmakers
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Grant
Ablation layer, photosensitive resin structure, method for producin...
Patent number
11,971,658
Issue date
Apr 30, 2024
Asahi Kasei Kabushiki Kaisha
Norikiyo Nakagawa
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Photoresist composition and method of forming photoresist pattern
Patent number
11,971,659
Issue date
Apr 30, 2024
Taiwan Semiconductor Manufacturing Co., Ltd
Chun-Chih Ho
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Reducing device overlay errors
Patent number
11,971,664
Issue date
Apr 30, 2024
KLA-Tencor Corporation
Liran Yerushalmi
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Polymer containing photoacid generator
Patent number
11,970,557
Issue date
Apr 30, 2024
LG Chem, Ltd.
Jihye Kim
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Grant
Adhesion layers for EUV lithography
Patent number
11,972,948
Issue date
Apr 30, 2024
Brewer Science, Inc.
Andrea M. Chacko
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Photoresist composition and method of manufacturing a semiconductor...
Patent number
11,966,162
Issue date
Apr 23, 2024
Taiwan Semiconductor Manufacturing Company, Ltd
Tzu-Yang Lin
B82 - NANO-TECHNOLOGY
Information
Patent Grant
Semiconductor device production method employing silicon-containing...
Patent number
11,966,164
Issue date
Apr 23, 2024
NISSAN CHEMICAL CORPORATION
Wataru Shibayama
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Endpoint detection system for enhanced spectral data collection
Patent number
11,965,798
Issue date
Apr 23, 2024
Applied Materials, Inc.
Pengyu Han
G01 - MEASURING TESTING
Information
Patent Grant
Monoalkyl tin trialkoxides and/or monoalkyl tin triamides with low...
Patent number
11,966,158
Issue date
Apr 23, 2024
Inpria Corporation
Benjamin L. Clark
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Radiation-sensitive resin composition and method for forming pattern
Patent number
11,966,160
Issue date
Apr 23, 2024
JSR Corporation
Ryuichi Nemoto
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Method of measuring variation, inspection system, computer program,...
Patent number
11,966,168
Issue date
Apr 23, 2024
ASML Netherlands B.V.
Antoine Gaston Marie Kiers
G06 - COMPUTING CALCULATING COUNTING
Information
Patent Grant
Lithographic overlay correction and lithographic process
Patent number
11,966,170
Issue date
Apr 23, 2024
Taiwan Semiconductor Manufacturing Company Ltd.
Ai-Jen Hung
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Three-dimensional dye, manufacturing method of three-dimensional dy...
Patent number
11,965,101
Issue date
Apr 23, 2024
TCL China Star Optoelectronics Technology Co., Ltd.
Lin Ai
C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information
Patent Grant
Imprint apparatus, imprint method, and article manufacturing method
Patent number
11,966,157
Issue date
Apr 23, 2024
Canon Kabushiki Kaisha
Kengo Kamei
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Measurement apparatus and a method for determining a substrate grid
Patent number
11,966,166
Issue date
Apr 23, 2024
ASML Netherlands B.V.
Franciscus Godefridus Casper Bijnen
G06 - COMPUTING CALCULATING COUNTING
Information
Patent Grant
Method for producing overlay results with absolute reference for se...
Patent number
11,966,171
Issue date
Apr 23, 2024
Tokyo Electron Limited
Anton J. deVilliers
G06 - COMPUTING CALCULATING COUNTING
Information
Patent Grant
Lithographic printing plate precursors and method of use
Patent number
11,964,466
Issue date
Apr 23, 2024
Eastman Kodak Company
Oliver Merka
B41 - PRINTING LINING MACHINES TYPEWRITERS STAMPS
Patents Applications
last 30 patents
Information
Patent Application
SALT, ACID GENERATOR, RESIN, RESIST COMPOSITION AND METHOD FOR PROD...
Publication number
20240142872
Publication date
May 2, 2024
Sumitomo Chemical Company, Limited
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
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Patent Application
SEMICONDUCTOR SUBSTRATE MANUFACTURING METHOD AND COMPOSITION
Publication number
20240142876
Publication date
May 2, 2024
JSR Corporation
H01 - BASIC ELECTRIC ELEMENTS
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Patent Application
SEMICONDUCTOR PROCESSING TOOL AND METHODS OF OPERATION
Publication number
20240142878
Publication date
May 2, 2024
Taiwan Semiconductor Manufacturing Company, Ltd.
H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
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Patent Application
IMAGE BASED OVERLAY MARK AND IMAGE BASED OVERLAY MEASURING METHOD U...
Publication number
20240142884
Publication date
May 2, 2024
SK HYNIX INC.
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
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Patent Application
SUBSTRATE PROCESSING APPARATUS
Publication number
20240142886
Publication date
May 2, 2024
Samsung Electronics Co., Ltd.
H01 - BASIC ELECTRIC ELEMENTS
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Patent Application
SUBSTRATE TREATING APPARATUS
Publication number
20240142171
Publication date
May 2, 2024
SEMES CO., LTD.
F26 - DRYING
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Patent Application
INTEGRATED DRY PROCESSES FOR PATTERNING RADIATION PHOTORESIST PATTE...
Publication number
20240145272
Publication date
May 2, 2024
LAM RESEARCH CORPORATION
H01 - BASIC ELECTRIC ELEMENTS
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Patent Application
EXPOSURE METHOD, EXPOSURE APPARATUS, AND METHOD FOR MANUFACTURING A...
Publication number
20240142879
Publication date
May 2, 2024
Canon Kabushiki Kaisha
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
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Patent Application
EXPOSURE METHOD, EXPOSURE APPARATUS, AND METHOD FOR MANUFACTURING A...
Publication number
20240142880
Publication date
May 2, 2024
Canon Kabushiki Kaisha
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
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Patent Application
ELECTRO OPTICAL DEVICES FABRICATED USING DEEP ULTRAVIOLET RADIATION
Publication number
20240142808
Publication date
May 2, 2024
HyperLight Corporation
G02 - OPTICS
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Patent Application
SUBSTRATE PROCESSING METHOD
Publication number
20240141501
Publication date
May 2, 2024
TOKYO ELECTRON LIMITED
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
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Patent Application
RESIN MEMBRANE FILTER AND MANUFACTURING METHOD OF RESIN MEMBRANE FI...
Publication number
20240139686
Publication date
May 2, 2024
FUJIFILM CORPORATION
B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
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Patent Application
ELECTRON BEAM LITHOGRAPHY APPARATUS, ELECTRON BEAM LITHOGRAPHY METH...
Publication number
20240145212
Publication date
May 2, 2024
NIPPON CONTROL SYSTEM CORPORATION
H01 - BASIC ELECTRIC ELEMENTS
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Patent Application
ALUMINUM OXIDE CARBON HYBRID HARDMASKS AND METHODS FOR MAKING THE SAME
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20240145245
Publication date
May 2, 2024
Applied Materials, Inc.
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
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Patent Application
METHOD FOR DECOUPLING SOURCES OF VARIATION RELATED TO SEMICONDUCTOR...
Publication number
20240142959
Publication date
May 2, 2024
ASML NETHERLANDS B.V.
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
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Patent Application
Photopolymerizable Composition
Publication number
20240142873
Publication date
May 2, 2024
XETOS AG
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
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Patent Application
NON-CHEMICALLY AMPLIFIED RESIST COMPOSITION AND METHOD OF MANUFACTU...
Publication number
20240142874
Publication date
May 2, 2024
Samsung Electronics Co., Ltd.
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
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Patent Application
NEGATIVE TYPE PHOTOSENSITIVE COMPOSITION
Publication number
20240142875
Publication date
May 2, 2024
Merck Patent GmbH
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
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Patent Application
EXPOSURE APPARATUS AND MEASUREMENT SYSTEM
Publication number
20240142877
Publication date
May 2, 2024
Nikon Corporation
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
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Patent Application
SYSTEM AND METHOD FOR DISCOVERING PHOTORESIST DISSOLVENT
Publication number
20240142882
Publication date
May 2, 2024
Samsung Electronics Co., Ltd.
H01 - BASIC ELECTRIC ELEMENTS
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Patent Application
Overlay Estimation Based on Optical Inspection and Machine Learning
Publication number
20240142883
Publication date
May 2, 2024
KLA Corporation
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
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Patent Application
OBJECT TABLE, A STAGE APPARATUS AND A LITHOGRAPHIC APPARATUS
Publication number
20240142885
Publication date
May 2, 2024
ASML NETHERLANDS B.V.
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
METHOD AND SYSTEM FOR IMPRINTING UNIQUE IDENTIFIERS ON SEMICONDUCTO...
Publication number
20240143957
Publication date
May 2, 2024
Digitho Technologies Inc.
G06 - COMPUTING CALCULATING COUNTING
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Patent Application
INKJET HEAD, METHOD FOR PRODUCING SAME, METHOD FOR PRODUCING SEMICO...
Publication number
20240131841
Publication date
Apr 25, 2024
YAMAGATA UNIVERSITY
Shinri SAKAI
B41 - PRINTING LINING MACHINES TYPEWRITERS STAMPS
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Patent Application
LIQUID-REPELLING AGENT, CURABLE COMPOSITION, CURED PRODUCT, DIVIDIN...
Publication number
20240132730
Publication date
Apr 25, 2024
Central Glass Company, Limited
Yuta SAKAIDA
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
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Patent Application
HALOGEN-AND ALIPHATIC-CONTAINING ORGANOTIN PHOTORESISTS AND METHODS...
Publication number
20240134274
Publication date
Apr 25, 2024
LAM RESEARCH CORPORATION
Timothy William Weidman
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
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Patent Application
Polymer, Chemically Amplified Positive Resist Composition, Resist P...
Publication number
20240134280
Publication date
Apr 25, 2024
Shin-Etsu Chemical Co., Ltd.
Masahiro FUKUSHIMA
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
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Patent Application
OPERATING A METROLOGY SYSTEM, LITHOGRAPHIC APPARATUS, AND METHODS T...
Publication number
20240134289
Publication date
Apr 25, 2024
ASML NETHERLANDS B.V.
Bram Paul Theodoor VAN GOCH
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
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Patent Application
MEASUREMENT DEVICE, LITHOGRAPHY SYSTEM AND EXPOSURE APPARATUS, AND...
Publication number
20240134294
Publication date
Apr 25, 2024
Nikon Corporation
Yuichi Shibazaki
G01 - MEASURING TESTING
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Patent Application
OVERLAY MARK FORMING MOIRE PATTERN, OVERLAY MEASUREMENT METHOD USIN...
Publication number
20240136300
Publication date
Apr 25, 2024
AUROS TECHNOLOGY, INC.
Hyun Chul LEE
G06 - COMPUTING CALCULATING COUNTING