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Discharge tubes with provision for introducing objects or material to be exposed to the discharge
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H01J37/00
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Parent Industries
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ELECTRICITY
H01
Electric elements
H01J
ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
Current Industry
H01J37/00
Discharge tubes with provision for introducing objects or material to be exposed to the discharge
Sub Industries
H01J37/02
Details
H01J37/023
Means for mechanically adjusting components not otherwise provided for
H01J37/026
Means for avoiding or neutralising unwanted electrical charges on tube components
H01J37/04
Arrangements of electrodes and associated parts for generating or controlling the discharge
H01J37/045
Beam blanking or chopping
H01J37/05
Electron or ion-optical arrangements for separating electrons or ions according to their energy or mass
H01J37/06
Electron sources Electron guns
H01J37/061
Electron guns using electron multiplication
H01J37/063
Geometrical arrangement of electrodes for beam-forming
H01J37/065
Construction of guns or parts thereof
H01J37/067
Replacing parts of guns Mutual adjustment of electrodes
H01J37/07
Eliminating deleterious effects due to thermal effects or electric or magnetic fields
H01J37/073
Electron guns using field emission, photo emission, or secondary emission electron sources
H01J37/075
Electron guns using thermionic emission from cathodes heated by particle bombardment or by irradiation
H01J37/077
Electron guns using discharge in gases or vapours as electron sources
H01J37/08
Ion sources Ion guns
H01J37/09
Diaphragms Shields associated with electron or ion-optical arrangements Compensation of disturbing fields
H01J37/10
Lenses
H01J37/12
electrostatic
H01J37/14
magnetic
H01J37/141
Electromagnetic lenses
H01J37/1413
Means for interchanging parts of the lens
H01J37/1416
with supra-conducting coils
H01J37/143
Permanent magnetic lenses
H01J37/145
Combinations of electrostatic and magnetic lenses
H01J37/147
Arrangements for directing or deflecting the discharge along a desired path
H01J37/1471
for centering, aligning or positioning of ray or beam
H01J37/1472
Deflecting along given lines
H01J37/1474
Scanning means
H01J37/1475
magnetic
H01J37/1477
electrostatic
H01J37/1478
Beam tilting means
H01J37/15
External mechanical adjustment of electron or ion optical components
H01J37/153
Electron-optical or ion-optical arrangements for the correction of image defects
H01J37/16
Vessels Containers
H01J37/165
Means associated with the vessel for preventing the generation of or for shielding unwanted radiation
H01J37/18
Vacuum locks; Means for obtaining or maintaining the desired pressure within the vessel
H01J37/185
Means for transferring objects between different enclosures of different pressure or atmosphere
H01J37/20
Means for supporting or positioning the objects or the material Means for adjusting diaphragms or lenses associated with the support
H01J37/21
Means for adjusting the focus
H01J37/22
Optical or photographic arrangements associated with the tube
H01J37/222
Image processing arrangements associated with the tube
H01J37/224
Luminescent screens or photographic plates for imaging ; Apparatus specially adapted therefor
H01J37/226
Optical arrangements for illuminating the object; optical arrangements for collecting light from the object
H01J37/228
whereby illumination and light collection take place in the same area of the discharge
H01J37/24
Circuit arrangements not adapted to a particular application of the tube and not otherwise provided for
H01J37/241
High voltage power supply or regulation circuits
H01J37/242
Filament heating power supply or regulation circuits
H01J37/243
Beam current control or regulation circuits
H01J37/244
Detectors Associated components or circuits therefor
H01J37/248
Components associated with high voltage supply
H01J37/252
Tubes for spot-analysing by electron or ion beams Microanalysers
H01J37/256
using scanning beams
H01J37/26
Electron or ion microscopes Electron or ion diffraction tubes
H01J37/261
Details
H01J37/263
Contrast, resolution or power of penetration
H01J37/265
Controlling the tube; circuit arrangements adapted to a particular application not otherwise provided
H01J37/266
Measurement of magnetic- or electric fields in the object; Lorentzmicroscopy
H01J37/268
with scanning beams
H01J37/27
Shadow microscopy
H01J37/28
with scanning beams
H01J37/285
Emission microscopes
H01J37/29
Reflection microscopes
H01J37/292
using scanning ray
H01J37/295
Electron or ion diffraction tubes
H01J37/2955
using scanning ray
H01J37/30
Electron-beam or ion-beam tubes for localised treatment of objects
H01J37/3002
Details
H01J37/3005
Observing the objects or the point of impact on the object
H01J37/3007
Electron or ion-optical systems
H01J37/301
Arrangements enabling beams to pass between regions of different pressure
H01J37/302
Controlling tubes by external information
H01J37/3023
Programme control
H01J37/3026
Patterning strategy
H01J37/304
Controlling tubes by information coming from the objects or from the beam
H01J37/3045
Object or beam position registration
H01J37/305
for casting, melting, evaporating or etching
H01J37/3053
for evaporating or etching
H01J37/3056
for microworking
H01J37/31
for cutting or drilling
H01J37/315
for welding
H01J37/317
for changing properties of the objects or for applying thin layers thereon
H01J37/3171
for ion implantation
H01J37/3172
Maskless patterned ion implantation
H01J37/3174
Particle-beam lithography
H01J37/3175
Projection methods
H01J37/3177
Multi-beam
H01J37/3178
for applying thin layers on objects
H01J37/32
Gas-filled discharge tubes
H01J37/32009
Arrangements for generation of plasma specially adapted for examination or treatment of objects
H01J37/32018
Glow discharge
H01J37/32027
DC powered
H01J37/32036
AC powered
H01J37/32045
Circuits specially adapted for controlling the glow discharge
H01J37/32055
Arc discharge
H01J37/32064
Circuits specially adapted for controlling the arc discharge
H01J37/32073
Corona discharge
H01J37/32082
Radio frequency generated discharge
H01J37/32091
the radio frequency energy being capacitively coupled to the plasma
H01J37/321
the radio frequency energy being inductively coupled to the plasma
H01J37/3211
Antennas
H01J37/32119
Windows
H01J37/32128
using particular waveforms
H01J37/32137
controlling of the discharge by modulation of energy
H01J37/32146
Amplitude modulation, includes pulsing
H01J37/32155
Frequency modulation
H01J37/32165
Plural frequencies
H01J37/32174
Circuits specially adapted for controlling the RF discharge
H01J37/32183
Matching circuits, impedance matching circuits per se H03H7/38 and H03H7/40
H01J37/32192
Microwave generated discharge
H01J37/32201
Generating means
H01J37/32211
Means for coupling power to the plasma
H01J37/3222
Antennas
H01J37/32229
Waveguides
H01J37/32238
Windows
H01J37/32247
Resonators
H01J37/32256
Tuning means
H01J37/32266
Means for controlling power transmitted to the plasma
H01J37/32275
Microwave reflectors
H01J37/32284
Means for controlling or selecting resonance mode
H01J37/32293
using particular waveforms
H01J37/32302
Plural frequencies
H01J37/32311
Circuits specially adapted for controlling the microwave discharge
H01J37/32321
Discharge generated by other radiation
H01J37/3233
using charged particles
H01J37/32339
using electromagnetic radiation
H01J37/32348
Dielectric barrier discharge
H01J37/32357
Generation remote from the workpiece
H01J37/32366
Localised processing
H01J37/32376
Scanning across large workpieces
H01J37/32385
Treating the edge of the workpieces
H01J37/32394
Treating interior parts of workpieces
H01J37/32403
Treating multiple sides of workpieces
H01J37/32412
Plasma immersion ion implantation
H01J37/32422
Arrangement for selecting ions or species in the plasma
H01J37/32431
Constructional details of the reactor
H01J37/3244
Gas supply means
H01J37/32449
Gas control
H01J37/32458
Vessel
H01J37/32467
Material
H01J37/32477
characterised by the means for protecting vessels or internal parts
H01J37/32486
Means for reducing recombination coefficient
H01J37/32495
Means for protecting the vessel against plasma
H01J37/32504
Means for preventing sputtering of the vessel
H01J37/32513
Sealing means
H01J37/32522
Temperature
H01J37/32532
Electrodes
H01J37/32541
Shape
H01J37/3255
Material
H01J37/32559
Protection means
H01J37/32568
Relative arrangement or disposition of electrodes; moving means
H01J37/32577
Electrical connecting means
H01J37/32587
Triode systems
H01J37/32596
Hollow cathodes
H01J37/32605
Removable or replaceable electrodes or electrode systems
H01J37/32614
Consumable cathodes for arc discharge
H01J37/32623
Mechanical discharge control means
H01J37/32633
Baffles
H01J37/32642
Focus rings
H01J37/32651
Shields
H01J37/3266
Magnetic control means
H01J37/32669
Particular magnets or magnet arrangements for controlling the discharge
H01J37/32678
Electron cyclotron resonance
H01J37/32688
Multi-cusp fields
H01J37/32697
Electrostatic control
H01J37/32706
Polarising the substrate
H01J37/32715
Workpiece holder
H01J37/32724
Temperature
H01J37/32733
Means for moving the material to be treated
H01J37/32743
for introducing the material into processing chamber
H01J37/32752
for moving the material across the discharge
H01J37/32761
Continuous moving
H01J37/3277
of continuous material
H01J37/32779
of batches of workpieces
H01J37/32788
for extracting the material from the process chamber
H01J37/32798
Further details of plasma apparatus not provided for in groups H01J37/3244 - H01J37/32788; special provisions for cleaning or maintenance of the apparatus
H01J37/32807
Construction (includes replacing parts of the apparatus)
H01J37/32816
Pressure
H01J37/32825
Working under atmospheric pressure or higher
H01J37/32834
Exhausting
H01J37/32844
Treating effluent gases
H01J37/32853
Hygiene
H01J37/32862
In situ cleaning of vessels and/or internal parts
H01J37/32871
Means for trapping or directing unwanted particles
H01J37/3288
Maintenance
H01J37/32889
Connection or combination with other apparatus
H01J37/32899
Multiple chambers
H01J37/32908
Utilities
H01J37/32917
Plasma diagnostics
H01J37/32926
Software, data control or modelling
H01J37/32935
Monitoring and controlling tubes by information coming from the object and/or discharge
H01J37/32944
Arc detection
H01J37/32954
Electron temperature measurement
H01J37/32963
End-point detection
H01J37/32972
Spectral analysis
H01J37/32981
Gas analysis
H01J37/3299
Feedback systems
H01J37/34
operating with cathodic sputtering
H01J37/3402
using supplementary magnetic fields
H01J37/3405
Magnetron sputtering
H01J37/3408
Planar magnetron sputtering
H01J37/3411
Constructional aspects of the reactor
H01J37/3414
Targets
H01J37/3417
Arrangements
H01J37/342
Hollow targets
H01J37/3423
Shape
H01J37/3426
Material
H01J37/3429
Plural materials
H01J37/3432
Target-material dispenser
H01J37/3435
Target holders (includes backing plates and endblocks)
H01J37/3438
Electrodes other than cathode
H01J37/3441
Dark space shields
H01J37/3444
Associated circuits
H01J37/3447
Collimators, shutters, apertures
H01J37/345
Magnet arrangements in particular for cathodic sputtering apparatus
H01J37/3452
Magnet distribution
H01J37/3455
Movable magnets
H01J37/3458
Electromagnets in particular for cathodic sputtering apparatus
H01J37/3461
Means for shaping the magnetic field
H01J37/3464
Operating strategies
H01J37/3467
Pulsed operation
H01J37/347
Thickness uniformity of coated layers or desired profile of target erosion
H01J37/3473
Composition uniformity or desired gradient
H01J37/3476
Testing and control
H01J37/3479
Detecting exhaustion of target material
H01J37/3482
Detecting or avoiding eroding through
H01J37/3485
Means for avoiding target poisoning
H01J37/3488
Constructional details of particle beam apparatus not otherwise provided for
H01J37/3491
Manufacturing of targets
H01J37/3494
Adaptation to extreme pressure conditions
H01J37/3497
Temperature of target
H01J37/36
for cleaning surfaces while plating with ions of materials introduced into the discharge
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Publication date
May 2, 2024
COMET TECHNOLOGIES USA, INC.
STEPHEN E. SAVAS
H01 - BASIC ELECTRIC ELEMENTS
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Patent Application
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20240145247
Publication date
May 2, 2024
INFINEON TECHNOLOGIES AG
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H01 - BASIC ELECTRIC ELEMENTS
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Patent Application
FARADAY FACEPLATE
Publication number
20240145252
Publication date
May 2, 2024
Applied Materials, Inc.
Rutvij Naik
H01 - BASIC ELECTRIC ELEMENTS
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Patent Application
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Publication number
20240146219
Publication date
May 2, 2024
COMET TECHNOLOGIES USA, INC.
ANTHONY OLIVETI
H01 - BASIC ELECTRIC ELEMENTS
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Patent Application
FILM FORMING DEVICE AND FILM FORMING METHOD
Publication number
20240133031
Publication date
Apr 25, 2024
TOKYO ELECTRON LIMITED
Jun YAMAWAKU
H01 - BASIC ELECTRIC ELEMENTS
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Patent Application
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Publication number
20240136162
Publication date
Apr 25, 2024
LG Display Co., Ltd.
Young Gon KIM
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Patent Application
PLASMA CHAMBER FOR AN OPTICAL EMISSION SPECTROSCOPY INSTRUMENT
Publication number
20240136163
Publication date
Apr 25, 2024
Hitachi High-Tech Analytical Science GmbH
André PETERS
H01 - BASIC ELECTRIC ELEMENTS
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Patent Application
LONG-LIFE EXTENDED TEMPERATURE RANGE EMBEDDED DIODE DESIGN FOR ELEC...
Publication number
20240136214
Publication date
Apr 25, 2024
LAM RESEARCH CORPORATION
Siyuan TIAN
H01 - BASIC ELECTRIC ELEMENTS
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Patent Application
METHOD AND SYSTEMS USEFUL FOR PRODUCING ALUMINUM IONS
Publication number
20240136145
Publication date
Apr 25, 2024
Entegris, Inc.
Ying TANG
H01 - BASIC ELECTRIC ELEMENTS